发明名称 PHOTORESIST COMPOSITION AND METHOD OF FORMING A COLOR FILTER USING THE SAME
摘要 Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10% by weight of a monomer, about 1% by weight to about 15% by weight of a photo initiator configured to be activated a light having a peak wavelength from about 400 nm to about 410 nm, about 1% by weight to about 10% by weight of a pigment, about 0.01% by weight to about 1% by weight of a pigment dispersing agent, and a solvent.
申请公布号 US2013302727(A1) 申请公布日期 2013.11.14
申请号 US201213655597 申请日期 2012.10.19
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 LEE KI-BEOM;SIM SU-YEON;CHANG JAE-HYUK;KIM CHANG-HOON;LEE HI-KUK
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
代理机构 代理人
主权项
地址