| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus which can prevent dust from adhering to a substrate during formation a film.SOLUTION: A film forming apparatus includes: a chamber 10 in which a substrate 1 is placed; a suction device provided with a suction port 11 for sucking the interior of the chamber 10; a vapor deposition source 14 disposed inside the chamber 10 and storing a film forming material; and a charging member 17 disposed inside the chamber 10 and adsorbing dust. |
