| 摘要 |
A method of manufacturing a pattern on a substrate web includes providing a production tool having a surface relief structure of elevations and depressions. The elevations correspond to a desired pattern. A curable material is applied to the elevations. The material is brought into contact with a substrate web at a first location. The substrate web and surface relief structure are transported together in contact from the first location to a second location spaced from one another along the transport direction of the substrate web. The substrate web is separated from the surface relief structure at the second location whereupon the material forming the pattern is affixed to and carried by the substrate web. The material is cured by exposure to a curing energy source, either between the first and second locations and/or after the substrate web has been separated from the surface relief structure at the second location. |
