发明名称 Oxide thin film transistor and method of fabricating the same
摘要 <p>An oxide thin film transistor (TFT) and a fabrication method thereof are provided. First and second data wirings are made of different metal materials, and an active layer is formed on the first data wiring to implement a short channel, thus enhancing performance of the TFT. The first data wiring in contact with the active layer is made of a metal material having excellent contact characteristics and the other remaining second data wiring is made of a metal material having excellent conductivity, so as to be utilized to a large-scale oxide TFT process. Also, the first and second data wirings may be formed together by using half-tone exposure, simplifying the process.</p>
申请公布号 GB2492627(B) 申请公布日期 2013.11.13
申请号 GB20120010001 申请日期 2012.06.06
申请人 LG DISPLAY CO., LTD. 发明人 HWAN KIM;HEUNG-LYUL CHO;TAE YOUNG OH;JI-EUN JUNG
分类号 H01L29/786;H01L27/12 主分类号 H01L29/786
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