发明名称 Group 13 nitride semiconductor device and method of its manufacture
摘要 <p>Disclosed is a semiconductor device comprising a substrate (10); at least one semiconducting layer (12) comprising a nitride of a group 13 element on said substrate; and an ohmic contact (20) on the at least one semiconducting layer, said ohmic contact comprising a silicon-comprising portion (22) on the at least one semiconducting layer and a metal portion (24) adjacent to and extending over said silicon-comprising portion, the metal portion comprising titanium and a further metal. A method of manufacturing such a semiconductor device is also disclosed.</p>
申请公布号 EP2662884(A1) 申请公布日期 2013.11.13
申请号 EP20120167365 申请日期 2012.05.09
申请人 NXP B.V. 发明人 DONKERS, JOHANNES JOSEPHUS THEODORUS MARINUS;HEIL, STEPHAN;DELHOUGNE, ROMAIN;BROEKMAN, HANS
分类号 H01L21/285;H01L29/20;H01L29/45;H01L29/66 主分类号 H01L21/285
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