发明名称 Compound semiconductor device and manufacturing method thereof
摘要 A first AlGaN layer formed over a substrate, a second AlGaN layer formed over the first AlGaN layer, an electron transit layer formed over the second AlGaN layer, and an electron supply layer formed over the electron transit layer are provided. A relationship of "0@x1<x2@1" is found when a composition of the first AlGaN layer is represented by Alx1Ga1-x1N, and a composition of the second AlGaN layer is represented by Alx2Ga1-x2N. Negative charges exist at an upper surface of the AlGaN layer more than positive charges existing at a lower surface of the AlGaN layer.
申请公布号 US8581335(B2) 申请公布日期 2013.11.12
申请号 US201113238258 申请日期 2011.09.21
申请人 IMANISHI KENJI;KIKKAWA TOSHIHIDE;FUJITSU LIMITED 发明人 IMANISHI KENJI;KIKKAWA TOSHIHIDE
分类号 H01L29/66 主分类号 H01L29/66
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