发明名称 |
Charged particle beam apparatus and geometrical aberration measurement method therefor |
摘要 |
Disclosed is a scanning charged particle microscope provided with an aberration measuring means that measures high-order geometrical aberration at high precision and high speed. An image obtained by a single-hole aperture and an image obtained by a multiple-hole aperture arranged in a region larger than that for the single-hole aperture are deconvoluted, an aberration quantity is determined based on the profiles of beams tilted in a plurality of directions and the obtained quantity is fed back to an aberration corrector.
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申请公布号 |
US8581190(B2) |
申请公布日期 |
2013.11.12 |
申请号 |
US200913058540 |
申请日期 |
2009.08.05 |
申请人 |
NAKANO TOMONORI;KAWASAKI TAKESHI;HIROSE KOTOKO;ITO HIROYUKI;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NAKANO TOMONORI;KAWASAKI TAKESHI;HIROSE KOTOKO;ITO HIROYUKI |
分类号 |
G01N23/225 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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