发明名称 Semiconductor device
摘要 A semiconductor device comprises a GaAs substrate having a first major surface and a second major surface opposite to each other; a first metal layer composed of at least one of Pd, Ta, and Mo on the first major surface of the GaAs substrate; and a second metal layer composed of a Ni alloy or Ni on the first metal layer.
申请公布号 US8581411(B2) 申请公布日期 2013.11.12
申请号 US20100766966 申请日期 2010.04.26
申请人 NISHIZAWA KOICHIRO;MITSUBISHI ELECTRIC CORPORATION 发明人 NISHIZAWA KOICHIRO
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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