发明名称 |
Alignment tolerant patterning on flexible substrates |
摘要 |
A method is provided for fabricating a multilayer electronic device on a flexible substrate including at least a first and a second patterned layer, wherein the first patterned layer is defined with a linewidth that is smaller than the linewidth of the second patterned layer, and the second patterned layer is defined by a patterning technique which is capable of correcting for local distortions of the pattern of said first layer on top of the flexible substrate and wherein the first patterned layer is laid-out in such a way that the geometric overlap between a portion of the second layer and a portion of the first layer is insensitive against small variations of the position of the second patterned layer.
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申请公布号 |
US8581240(B2) |
申请公布日期 |
2013.11.12 |
申请号 |
US201213439550 |
申请日期 |
2012.04.04 |
申请人 |
SIRRINGHAUS HENNING;BURNS SEAMUS;PLASTIC LOGIC LIMITED |
发明人 |
SIRRINGHAUS HENNING;BURNS SEAMUS |
分类号 |
H01L35/24 |
主分类号 |
H01L35/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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