发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES
摘要 There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), R0 is a hydrogen atom or a methyl group; R1 is a single bond or a C1-5 alkylene group; R2 is a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), R0s are optionally different from each other).
申请公布号 KR20130123406(A) 申请公布日期 2013.11.12
申请号 KR20137015197 申请日期 2011.11.21
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 SODA HIROYUKI;SAKAGUCHI TAKAHIRO;KISHIOKA TAKAHIRO
分类号 G03F7/023;C08F222/40;G02B1/04;G02B3/00 主分类号 G03F7/023
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