发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES |
摘要 |
There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), R0 is a hydrogen atom or a methyl group; R1 is a single bond or a C1-5 alkylene group; R2 is a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), R0s are optionally different from each other). |
申请公布号 |
KR20130123406(A) |
申请公布日期 |
2013.11.12 |
申请号 |
KR20137015197 |
申请日期 |
2011.11.21 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
SODA HIROYUKI;SAKAGUCHI TAKAHIRO;KISHIOKA TAKAHIRO |
分类号 |
G03F7/023;C08F222/40;G02B1/04;G02B3/00 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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