| 摘要 |
A device for transfer of vacuum-art plasma streams is proposed. The device comprises the plasma-guide with inlet and outlet sections as pipes lengths covered by main electromagnet coils for formation of transfer magnet field, at that inlet section of plasma-guide has cover and bottom, and outlet section of plasma-guide is connected with inlet section via outlet axis aperture in its bottom. Cover of outlet section has at least two inlet aperture offset relative to axis of plasma-guide, which are purposed for connecting of vacuum-art sources of plasma, and axis aperture through which defected electromagnet coil covered by case is entered for formation additional magnet field on its axis direction opposite to transfer direction of magnet field, at that said case has cup-shaped bottom of which faces toward the bottom of inlet section of plasma-guide. The device provides possibility to transportation more than two plasma streams without design complication at high cleaning efficiency of plasma streams from macroparticles and provides uniform distribution of component concentrations of deposited coatings. |
