| 摘要 |
The present invention relates to fabrics with a cut loop structure and a manufacturing method thereof, wherein central yarn protrudes from the outside of covering yarn and synthetic fiber monofilament is divided into multi-filaments. The fabrics with a cut loop structure easily catch and wipe foreign materials like fine dust and hair by the synthetic fiber monofilament and improve cleaning efficiency, slip, absorption, drying, and tactility. Therefore, the fabrics with a cut loop structure according to the present invention can be usefully used for products including a dishcloth, a dustcloth, a towel, a mat, and bathing articles. |
