| 摘要 |
A method for fabricating InP-based high electron-mobility transistors (HEMTs) and GaAs-based metamorphic electron-mobility transistors (MHEMTs) by utilizing asymmetrically recessed Gamma-gates and self-aligned ohmic electrodes is disclosed. The fabrication starts with mesa isolation, followed by gate recess and gate metal deposition, in which the gate foot is placed asymmetrically in the recess groove, with the offset towards the source. It is important to use Gamma-gates as the shadow mask for ohmic metal deposition, because it allows a source-gate spacing as small as 0.1 micron, greatly reducing the critical source resistance, and it retains a relatively large gate-drain spacing, enabling a decent breakdown voltage when coupled with the asymmetric gate recess. It is also critical to maintain a large stem height of the Gamma-gates to assure a sufficient gap between the top of the gates and the ohmic metal after its deposition to reduce the parasitic capacitance. The uniqueness of this technology would best fit the applications that require low voltage and/or low DC power consumption. |
