PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in sensitivity, resolution and rectangularity.SOLUTION: The photosensitive resin composition contains: (A-1) a polymer that comprises a constitutional unit having an acid group and a constitutional unit represented by the general formula (a-1); (A-2) a polymer that comprises a constitutional unit represented by the general formula (a-2); (B) a photoacid generator; and (C) a solvent. The general formula (a-1) and the general formula (a-2) are shown in the figure.