| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device capable of exposure transferring minute exposure patterns on a substrate with high resolution and in short tact time, by using a microlens array; and an exposing method.SOLUTION: An exposure device includes a mask stage 10; a substrate state 20; an illumination optical system 30 for emitting light for exposing patterns; and a microlens array 41 in which a plurality of microlenses 42 are aligned on a plane, and linearly extending in a Y-direction. The exposure device also includes a microlens placing plate 62 disposed between a mask M and the substrate W, and a microlens driving mechanism 60 for moving the microlens placing plate 62 in an X-direction. While the microlens placing plate 62 is moved in the X-direction, the light for exposing patterns is emitted, thereby exposure transferring mask patterns to the substrate W through the microlenses 42. |
