| 摘要 |
PROBLEM TO BE SOLVED: To provide a development device which inhibits the occurrence of uneven development.SOLUTION: A development device 1A includes: a discharge nozzle 21 discharging and supplying a developer to a processed surface of a substrate 100; a developing chamber 20 in which the discharge nozzle 21 is installed; a transfer path 2 provided so as to traverse the development chamber 20; and transfer rollers 3 moving the substrate 100 along a transfer direction with the processed surface facing upward on the transfer path 2. The transfer path 2 includes a downward inclination part 2B which inclines the substrate 100 so that a portion on the front end side of the substrate 100 is located at a position lower than the rear end side of the substrate 100 in an inlet port of the development chamber 20 when viewed from the transfer direction. The discharge nozzle 21 is disposed above the downward inclination part 2B. |
