发明名称 EVAPORATING APPARATUS CAPABLE OF MAKING PATTERNS
摘要 PURPOSE: A deposition apparatus capable of pattern making is provided to deposit a pattern desired by a user as a source is selectively sprayed. CONSTITUTION: A deposition apparatus capable of pattern making comprises a chamber part, a nozzle part(120), a shutter part, a supply part(140), a transfer part(150), an input part(160), and a control part(170). The nozzle part has an injection hole for spraying a source toward a substrate(20). The shutter part selectively opens and closes the injection hole of the nozzle part. The transfer part transfers the substrate or/and the nozzle part. The control part controls the shutter part or/and the transfer part. Therefore, the source is deposited in a predetermined pattern(30) on the substrate. [Reference numerals] (140) Supply unit; (160) Input unit; (170) Control unit
申请公布号 KR101325481(B1) 申请公布日期 2013.11.07
申请号 KR20110014525 申请日期 2011.02.18
申请人 发明人
分类号 C23C16/04;C23C16/44;C23C16/458;C23C16/52 主分类号 C23C16/04
代理机构 代理人
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