APPARATUS AND METHOD FDR CLEANING SUBSTRATES

摘要

The present invention relates to an apparatus and method for manufacturing a semiconductor substrate and, more particularly, to a substrate cleaning apparatus and a substrate cleaning method. A substrate cleaning apparatus according to one embodiment of the present invention includes: a first processing chamber to process a substrate by supplying processing liquid to the substrate; a second processing chamber to dry the substrate; and a transfer unit which transfers the substrate between the first and second processing chambers. The first processing chamber includes: a liquid processing housing with a space for processing the substrate; a spin chuck to support the substrate in the liquid processing housing; and a liquid supply member which supplies the processing liquid to the substrate which is supported by the spin chuck. The second processing chamber includes: a dry housing with a space for drying the substrate; a substrate support member to support the substrate in the dry housing; and a heater which heats the substrate and the substrate support member to support the substrate in the dry housing.