| 摘要 |
PROBLEM TO BE SOLVED: To provide a frame member which meets a demand for inhibiting the occurence of particles, and to provide an electron beam lithography device using the frame member.SOLUTION: A frame member 5 according to one embodiment of this invention includes: a frame like alumina sintered body 6; an alumina film 7 disposed on the alumina sintered body 6; and a conductive film 8 disposed on the alumina film 7. An electron beam lithography device 1 according to one embodiment of this invention includes: the frame member 5; and an electron gun 4 used for radiating an electronic beam E to a substrate 2. |
