发明名称 Semiconductor Device and Method of Forming TSV Semiconductor Wafer with Embedded Semiconductor Die
摘要 A semiconductor device has a TSV semiconductor wafer with a cavity formed in a first surface of the wafer. A second cavity can be formed in a second surface of the wafer. A plurality of semiconductor die is mounted within the cavities. The semiconductor die can be mounted side-by-side and/or stacked within the cavity. Conductive TSV can be formed through the die. An encapsulant is deposited within the cavity over the die. A CTE of the die is similar to a CTE of the encapsulant. A first interconnect structure is formed over a first surface of the encapsulant and wafer. A second interconnect structure is formed over a second surface of the encapsulant and wafer. The first and second interconnect structure are electrically connected to the TSV wafer. A second semiconductor die can be mounted over the first interconnect structure with encapsulant deposited over the second die.
申请公布号 US2013292851(A1) 申请公布日期 2013.11.07
申请号 US201313936099 申请日期 2013.07.05
申请人 STATS CHIPPAC, LTD. 发明人 PAGAILA REZA A.;LIN YAOJIAN;YOON SEUNG UK
分类号 H01L23/48 主分类号 H01L23/48
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