| 摘要 |
<p>A substrate processing device (100) projects a light (L) from a pattern of a mask (M) upon a surface of a substrate (S). The substrate processing device (100) comprises: a mask retaining unit (20) which is capable of revolving about a prescribed axle (AX1) and which retains a pattern of a mask along a cylinder face (22a) of a certain radius from the axle; a substrate retaining unit (30) which retains a substrate such that the substrate is positioned with a prescribed space between a surface of the substrate and the cylinder face of the mask retaining unit; a compartmentalizing member (C) which compartmentalizes a space (K) between the mask retaining unit and the substrate retaining unit, and at least a portion thereof being transmissible to the light from the pattern; and support mechanisms (53) which support the compartmentalizing member.</p> |
