发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a high-breakdown-voltage and inexpensive semiconductor device having a triple well structure.SOLUTION: A semiconductor device comprises: a first well of a second conductivity type opposite to a first conductivity type formed on a surface layer of a semiconductor substrate of the first conductivity type; a second well of the first conductivity type formed separately from the semiconductor substrate in the first well; an electric field relaxation region of the second conductivity type formed separately from the first well in the second well; and an embedded region of the first conductivity type formed in the second well and having higher impurity concentration than the second well. The embedded region is formed between a side surface and a bottom surface of the second well and the electric field relaxation region, and separated from the first well.
申请公布号 JP2013229442(A) 申请公布日期 2013.11.07
申请号 JP20120100130 申请日期 2012.04.25
申请人 SHARP CORP 发明人 HIROSAKI YUJI;TAKIMOTO TAKAHIRO;NARUSE KAZUFUMI;DOI KAZUTOMO
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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