METHODS AND APPARATUS FOR ISOLATING A RUNNING BEAM CONVEYOR FROM A SEMICONDUCTOR SUBSTRATE CLEANING ENVIRONMENT

摘要

In one aspect, a substrate cleaning system is provided. The substrate cleaning system includes a plurality of cleaning modules; a conveyor for transporting a substrate between the cleaning modules; and a partition assembly that isolates the cleaning modules from the conveyor. Apparatus and methods for isolating CMP cleaning modules from a conveyor are provided, as are numerous other aspects.