| 摘要 |
PROBLEM TO BE SOLVED: To stabilize the close contact holding of a polished material with compatibility with water at a holding surface while reducing a variation at a location, to stabilize the holding of the polished material by retaining water uniformly between the polished material and the holding surface and preventing the bite and retention of air, and to prevent a polishing liquid from infiltrating into a space between the polished material and a holding material from the end face of the polished material mounted to the holding material during polishing.SOLUTION: A holding material for the one-side polishing of a complex sheet manufactured by a wet film forming method is formed to reduce a contact angle of a holding surface to water and to reduce the variation of the contact angle by embossing the holding surface. |
