发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE |
摘要 |
Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.
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申请公布号 |
US2013293860(A1) |
申请公布日期 |
2013.11.07 |
申请号 |
US201313936793 |
申请日期 |
2013.07.08 |
申请人 |
NIKON ENGINEERING CO., LTD.;NIKON CORPORATION |
发明人 |
NAGASAKA HIROYUKI;OKUYAMA TAKESHI |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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