发明名称 |
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD |
摘要 |
The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to one embodiment of the present invention includes a process chamber forming an inner space for processing a substrate; a substrate support member supporting the substrate and arranged in the process chamber; a showerhead having a plasma supply hole connected to a lower space and an upper space, and facing the substrate support member to be divided into the lower space and the upper space; an excitation supply unit supplying an excitation gas to the upper space; a process supply unit supplying a process gas to the lower space; and a microwave application unit applying a microwave to the upper space. |
申请公布号 |
KR20130122496(A) |
申请公布日期 |
2013.11.07 |
申请号 |
KR20120086440 |
申请日期 |
2012.08.07 |
申请人 |
SEMES CO., LTD. |
发明人 |
JANG, YONG SU;KIM, SUN RAE;HONG, SUNG HWAN;LEE, TAE HYO |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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