EXPOSURE APPARATUS, AND LIQUID RECOVERY METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus which maintains a liquid immersion region in a desired state, and can excellently carry out exposure processing.SOLUTION: An exposure apparatus EX exposes a substrate P by irradiating the substrate P with exposure light EL through a projection optical system PL and liquid LQ. The exposure apparatus EX is provided with a liquid immersion mechanism 1 for supplying the liquid LQ and also recovering the liquid LQ. The liquid immersion mechanism 1 has an inclined plane 2 which is formed so as to face a surface of the substrate P, and a liquid recovering port 22 of the liquid immersion mechanism 1 is formed on the inclined plane 2.