发明名称 |
METALIZATION RESIN FILM AND MANUFACTURING METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a metalization resin film which enhances workability of fine wiring.SOLUTION: In the metalization resin film composed of a resin film substrate 1, an underlying metal layer 2 composed of a nickel alloy formed on the surface of the resin film substrate 1 with no adhesive interposed therebetween, and a metal laminate 4 consisting of a copper layer formed on the surface thereof, the ratio (OR/OR) of crystal percentage ORin the 111 orientation to crystal percentage ORin the 001 orientation of a crystal included in a thickness range down to 0.4 μm from the resin film substrate surface in the metal laminate measured by electron beam backscatter diffraction method is 7 or less. |
申请公布号 |
JP2013229504(A) |
申请公布日期 |
2013.11.07 |
申请号 |
JP20120101505 |
申请日期 |
2012.04.26 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
NOGUCHI MASASHI;SHIMAMURA TOMIO;TAKENOUCHI HIROSHI;HATA HIROKI;NAGATA JUNICHI |
分类号 |
H05K1/09;B32B15/04;B32B15/08;C23C14/14;H05K1/03 |
主分类号 |
H05K1/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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