发明名称 METALIZATION RESIN FILM AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a metalization resin film which enhances workability of fine wiring.SOLUTION: In the metalization resin film composed of a resin film substrate 1, an underlying metal layer 2 composed of a nickel alloy formed on the surface of the resin film substrate 1 with no adhesive interposed therebetween, and a metal laminate 4 consisting of a copper layer formed on the surface thereof, the ratio (OR/OR) of crystal percentage ORin the 111 orientation to crystal percentage ORin the 001 orientation of a crystal included in a thickness range down to 0.4 μm from the resin film substrate surface in the metal laminate measured by electron beam backscatter diffraction method is 7 or less.
申请公布号 JP2013229504(A) 申请公布日期 2013.11.07
申请号 JP20120101505 申请日期 2012.04.26
申请人 SUMITOMO METAL MINING CO LTD 发明人 NOGUCHI MASASHI;SHIMAMURA TOMIO;TAKENOUCHI HIROSHI;HATA HIROKI;NAGATA JUNICHI
分类号 H05K1/09;B32B15/04;B32B15/08;C23C14/14;H05K1/03 主分类号 H05K1/09
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