发明名称 |
CRUCIBLE FOR GROWING SINGLE CRYSTAL, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING SINGLE CRYSTAL SILICON |
摘要 |
PROBLEM TO BE SOLVED: To provide: a crucible for growing a single crystal, capable of manufacturing a single crystal silicon showing higher conversion efficiency than a conventional single crystal silicon by preventing impurities from being mixed when pulling up the single crystal silicon in a CZ method; a method for manufacturing the crucible for growing the single crystal silicon; and a method for manufacturing the single crystal silicon.SOLUTION: A crucible for growing a single crystal, used for growing a single crystal silicon by a Czochralski method, has: a low temperature-melting layer formed in a surface of the crucible body in a side contacting molten silicon, and melting at a lower temperature than the sintering temperature of a crucible body comprising a castable refractory material; and a coating layer showing porosity of 50% or more and having thickness of 0.1 mm or less by applying slurry containing silicon nitride on the low temperature-melting layer and then sintering the same. A method for manufacturing the same and a method for manufacturing the single crystal silicon using the same are also disclosed. |
申请公布号 |
JP2013227171(A) |
申请公布日期 |
2013.11.07 |
申请号 |
JP20120100591 |
申请日期 |
2012.04.26 |
申请人 |
KYODO FINE CERAMICS CO LTD |
发明人 |
ISOMURA KEIICHIRO;YAMAZAKI SADAYA;SAITO TAKASHI |
分类号 |
C30B29/06;C30B15/10 |
主分类号 |
C30B29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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