发明名称 CRUCIBLE FOR GROWING SINGLE CRYSTAL, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING SINGLE CRYSTAL SILICON
摘要 PROBLEM TO BE SOLVED: To provide: a crucible for growing a single crystal, capable of manufacturing a single crystal silicon showing higher conversion efficiency than a conventional single crystal silicon by preventing impurities from being mixed when pulling up the single crystal silicon in a CZ method; a method for manufacturing the crucible for growing the single crystal silicon; and a method for manufacturing the single crystal silicon.SOLUTION: A crucible for growing a single crystal, used for growing a single crystal silicon by a Czochralski method, has: a low temperature-melting layer formed in a surface of the crucible body in a side contacting molten silicon, and melting at a lower temperature than the sintering temperature of a crucible body comprising a castable refractory material; and a coating layer showing porosity of 50% or more and having thickness of 0.1 mm or less by applying slurry containing silicon nitride on the low temperature-melting layer and then sintering the same. A method for manufacturing the same and a method for manufacturing the single crystal silicon using the same are also disclosed.
申请公布号 JP2013227171(A) 申请公布日期 2013.11.07
申请号 JP20120100591 申请日期 2012.04.26
申请人 KYODO FINE CERAMICS CO LTD 发明人 ISOMURA KEIICHIRO;YAMAZAKI SADAYA;SAITO TAKASHI
分类号 C30B29/06;C30B15/10 主分类号 C30B29/06
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