| 摘要 |
PROBLEM TO BE SOLVED: To provide a porous silica film having high wear resistance and being excellent in low refractive index, antifouling property and the like.SOLUTION: A porous silica film satisfies the following (1) and (2): (1) in a region from a surface of the porous silica film to a position of 10 nm in the depth direction from the surface, the ratio of the number of fluorine atoms to the total number of carbon atoms, oxygen atoms, fluorine atoms and silicon atoms is 3-35 atomic% as calculated by elemental analysis by X-ray photoelectron spectroscopy (XPS), (2) in a region from a position of 10 nm in the depth direction from the surface of the porous silica film to a position of 40 nm in the depth direction from the surface, the ratio of the number of fluorine atoms to the total number of carbon atoms, oxygen atoms, fluorine atoms and silicon atoms is ≤0.8 atomic% as calculated by elemental analysis by XPS in the depth direction. |
