发明名称 COMPOSITION FOR FILM FORMATION, DIFFUSION AGENT COMPOSITION, METHOD FOR MANUFACTURING COMPOSITION FOR FILM FORMATION, AND METHOD FOR MANUFACTURING DIFFUSION AGENT COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a technique for improving storage stability of a composition for film formation.SOLUTION: A composition for film formation comprises: a siloxane polymer A including a condensed product A1 derived from an alkoxysilane including four functional alkoxysilanes represented by a chemical formula 1 described below as a starting material, and a condensed product A2 derived from an alkoxysilane represented by a chemical formula 2 described below as a starting material; and an organic solvent B. The siloxane polymer A has a content of the condensed product A1 of 75 mass% or less in terms of SiOwith respect to a total amount of the condensed product A1 and the condensed product A2. The chemical formula 1: Si(OR), where Ris an organic group, and a plurality of Rs may be the same or different. The chemical formula 2: RSi(OR), where Rand Rare organic groups, and n is an integer of 1 or 2. If Ris plural, a plurality of Rs may be the same or different, and if (OR) is plural, a plurality of (OR)s may be the same or different.
申请公布号 JP2013229391(A) 申请公布日期 2013.11.07
申请号 JP20120098988 申请日期 2012.04.24
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KAMIZONO TAKASHI;MORITA TOSHIRO
分类号 H01L21/225;C09D11/00;H01L31/04 主分类号 H01L21/225
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