发明名称 |
PLASMA GENERATING APPARATUS AND PLASMA PROCESSING APPARATUS |
摘要 |
<p>A flange, which forms a portion of a vacuum container, has a rectangular opening surrounded by an insulating frame. A plate-shaped radio-frequency antenna conductor 13 is provided so as to cover the opening, with the insulating frame clamped thereby. In this structure, a radio-frequency power source is connected via a matching box to one end along the length of the radio-frequency antenna conductor, the other end is connected to ground, and electric power is supplied so that a radio-frequency current flows from one end of the radio-frequency antenna conductor to the other. By this method, the impedance of the radio-frequency antenna conductor can be lowered, and high-density plasma with a low electron temperature can be efficiently generated.</p> |
申请公布号 |
EP2299789(A4) |
申请公布日期 |
2013.11.06 |
申请号 |
EP20090750378 |
申请日期 |
2009.05.21 |
申请人 |
EMD CORPORATION;ANDO, YASUNORI |
发明人 |
ANDO, YASUNORI;EBE, AKINORI;WATANABE, MASANORI |
分类号 |
H05H1/46;C23C16/507;H01J37/32;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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