发明名称
摘要 PROBLEM TO BE SOLVED: To find out that characteristics of an electronic device to be manufactured are adversely affected by an atmosphere of a heat treatment apparatus used for manufacture of the electronic device and to reduce adverse influence. SOLUTION: An inner surface of the heat treatment apparatus is covered with an oxide passivation film, and has a center average roughness Ra of ≤1 μm. Such a heat treatment apparatus can reduce deterioration of thermosetting resin due to dissolution, dissociation etc., of thermosetting resin during a treatment for curing the thermosetting resin. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5335843(B2) 申请公布日期 2013.11.06
申请号 JP20110062046 申请日期 2011.03.22
申请人 发明人
分类号 H01L21/312 主分类号 H01L21/312
代理机构 代理人
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