| 摘要 |
Residual product trapping apparatus, and a fabricating apparatus of a semiconductor device using the same are provided to enable the flow of discharge gas while maintaining a trapping performance of a residual product and to remove the trapped residual product efficiently by improving a trapping apparatus. A housing(310) which has a discharge gas input unit and a discharge gas output unit includes a passage way which connects the input unit(321) to the output unit(323) and is placed at an inner upper portion of the housing. A trapping plate combination body(330) which is placed at an inner power portion of the housing includes multistep trapping plates at which a residual product is trapped by contacting with the discharge gas inflowing into the discharge gas input unit. The housing includes: a horizontal passage unit which makes the passage be horizontal; and at least one vertical passage unit(313) which enlarges the horizontal passage unit(311) in the vertical direction. |
