| 摘要 |
A gas injection apparatus and a substrate processing apparatus having the same are provided to prevent a gas from being resolved before the gas reaches a substrate by installing a cooling unit at a gas injection unit. A gas injection apparatus comprises a plurality of gas injection units(210,220), a number of gas supply units(230,240), and a cooling unit(400). Gases with different resolution temperatures are injected through the gas injection units. The gas supply units are connected with the gas injection units and supply different gases to the gas injection units. The cooling unit is installed at the gas injection unit which injects gas with lower resolution temperature. |
