发明名称 |
MULTICOLUMN ELECTRON BEAM EXPOSURE APPARATUS AND MAGNETIC FIELD GENERATIon device |
摘要 |
<p>A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, each of the two annular permanent magnets being magnetized in an optical axis direction and being symmetrical about the optical axis, the electromagnetic coils disposed near the annular permanent magnets and used to adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, the substrate having the electron beam converging unit disposed in a side portion of each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction with same polarities facing each other, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.</p> |
申请公布号 |
EP2302664(B1) |
申请公布日期 |
2013.11.06 |
申请号 |
EP20080790570 |
申请日期 |
2008.06.24 |
申请人 |
ADVANTEST CORPORATION |
发明人 |
YASUDA, HIROSHI;OOAE, YOSHIHISA;HARAGUCHI, TAKESHI |
分类号 |
H01J37/317;B82Y10/00;B82Y40/00;H01J37/06;H01J37/14;H01J37/143 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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