发明名称 Diffraction grating for X-ray Talbot interferometer, method of manufacturing the same, and X-ray Talbot interferometer
摘要 <p>Provided are a diffraction grating for an X-ray Talbot interferometer, a method of manufacturing the same, and an X-ray Talbot interferometer, the method enabling easy and highly accurate manufacturing of a diffraction grating having grooves with a high aspect ratio. The diffraction grating for an X-ray Talbot interferometer includes a plurality of ridge-like X-ray absorbing portions (20b) formed on a substrate (22) along one direction at predetermined intervals through cutting of a metal film. </p>
申请公布号 EP2511912(A3) 申请公布日期 2013.11.06
申请号 EP20120164092 申请日期 2012.04.13
申请人 HITACHI HIGH-TECH SCIENCE CORPORATION 发明人 NAKAGAWA, YOSHITOMO;SHIRAKAWABE, YOSHIHARU;NAKAYAMA, SATOSHI;NAGATA, ATSUSHI;UMEMOTO, TAKESHI;WATANABE, MAYU
分类号 G21K1/06 主分类号 G21K1/06
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