发明名称 |
Diffraction grating for X-ray Talbot interferometer, method of manufacturing the same, and X-ray Talbot interferometer |
摘要 |
<p>Provided are a diffraction grating for an X-ray Talbot interferometer, a method of manufacturing the same, and an X-ray Talbot interferometer, the method enabling easy and highly accurate manufacturing of a diffraction grating having grooves with a high aspect ratio. The diffraction grating for an X-ray Talbot interferometer includes a plurality of ridge-like X-ray absorbing portions (20b) formed on a substrate (22) along one direction at predetermined intervals through cutting of a metal film.
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申请公布号 |
EP2511912(A3) |
申请公布日期 |
2013.11.06 |
申请号 |
EP20120164092 |
申请日期 |
2012.04.13 |
申请人 |
HITACHI HIGH-TECH SCIENCE CORPORATION |
发明人 |
NAKAGAWA, YOSHITOMO;SHIRAKAWABE, YOSHIHARU;NAKAYAMA, SATOSHI;NAGATA, ATSUSHI;UMEMOTO, TAKESHI;WATANABE, MAYU |
分类号 |
G21K1/06 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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