发明名称 Semiconductor device and method of manufacturing the same
摘要 <p>In a high electron mobility transistor, with a normally-off operation maintained, on-resistance can be sufficiently reduced, so that the performance of a semiconductor device including the high electron mobility transistor is improved. Between a channel layer and an electron supply layer, a spacer layer whose band gap is larger than the band gap of the electron supply layer is provided. Thereby, due to the fact that the band gap of the spacer layer is large, a high potential barrier (electron barrier) is formed in the vicinity of an interface between the channel and the electron supply layer.</p>
申请公布号 EP2660866(A2) 申请公布日期 2013.11.06
申请号 EP20130163319 申请日期 2013.04.11
申请人 RENESAS ELECTRONICS CORPORATION 发明人 ANDO, YUJI;OTA, KAZUKI
分类号 H01L29/778;H01L21/337;H01L29/10;H01L29/20;H01L29/205 主分类号 H01L29/778
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