| 发明名称 |
DEPOSITION SYSTEMS AND PROCESSES |
| 摘要 |
This disclosure enables gas recovery and utilization for use in deposition systems and processes. The system includes a thin-film semiconductor layer deposition system comprising a deposition reactor, precursor gas feeds, and a gas recovery system. |
| 申请公布号 |
EP2659504(A1) |
申请公布日期 |
2013.11.06 |
| 申请号 |
EP20110856289 |
申请日期 |
2011.12.31 |
| 申请人 |
SOLEXEL, INC. |
发明人 |
KRAMER, KARL-JOSEF;MOSLEHI, MEHRDAD, M.;YOKOI, SEIICHI;KAMIAN, GEORGE, D.;SHARMA, SHASHANK;ASHJAEE, JAY |
| 分类号 |
H01L21/205;C23C16/44;C23C16/455;C23C16/458;C23C16/48;C30B25/12;C30B25/14;C30B29/06;H01L21/20 |
主分类号 |
H01L21/205 |
| 代理机构 |
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