发明名称 Method for producing semiconductor crystal, apparatus for crystal production and group 13 element nitride semiconductor crystal
摘要 A semiconductor crystal is produced through crystal growth in the presence of a solvent in a supercritical and/or subcritical state in a reactor, wherein at least a part of the surface of the reactor and the surface of the member to be used inside the reactor is coated with a platinum group-Group 13 metal alloy coating film.
申请公布号 US8574532(B2) 申请公布日期 2013.11.05
申请号 US201113337592 申请日期 2011.12.27
申请人 FUJISAWA HIDEO;MIKAWA YUTAKA;MITSUBISHI CHEMICAL CORPORATION 发明人 FUJISAWA HIDEO;MIKAWA YUTAKA
分类号 C01F1/00;C01B21/06;C30B19/00 主分类号 C01F1/00
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