发明名称 Ion source apparatus and methods of using the same
摘要 An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.
申请公布号 US8575565(B2) 申请公布日期 2013.11.05
申请号 US201113269795 申请日期 2011.10.10
申请人 FRATI MAXIMO;GUARDIAN INDUSTRIES CORP. 发明人 FRATI MAXIMO
分类号 H01J1/50;G21K5/04 主分类号 H01J1/50
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