发明名称 Silicon carbide crystal and method of manufacturing silicon carbide crystal
摘要 An SiC crystal has Fe concentration not higher than 0.1 ppm and Al concentration not higher than 100 ppm. A method of manufacturing an SiC crystal includes the following steps. SiC powders for polishing are prepared as a first source material. A first SiC crystal is grown by sublimating the first source material through heating and precipitating an SiC crystal. A second source material is formed by crushing the first SiC crystal. A second SiC crystal is grown by sublimating the second source material through heating and precipitating an SiC crystal. Thus, an SiC crystal and a method of manufacturing an SiC crystal capable of achieving suppressed lowering in quality can be obtained.
申请公布号 US8574529(B2) 申请公布日期 2013.11.05
申请号 US201113499482 申请日期 2011.02.25
申请人 SASAKI MAKOTO;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 SASAKI MAKOTO
分类号 C01B31/36;B32B3/02;B32B5/16;B32B9/04;C30B23/00;H01L29/06 主分类号 C01B31/36
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