| 摘要 |
The present invention provides a pellicle capable of preventing a photomask from being hurt since the photomask do not come in contact with a frame even when the pressure applied to the photomask is strong. The pellicle comprises a pellicle film which is adhered to one end face of the frame and an adhesion layer which is formed in the other end face of the frame. The adhesion layer includes an adhesive and a particulate spacer. The hardness of the spacer measured by durometer type A is less than 80 and is harder than the adhesive. |
