| 摘要 |
PURPOSE: A film type transfer material is provided to maintain development property while overcoming the degradation of chemical resistance and adhesive power of a conventional photopolymerizable film type transfer material, and to be used in forming resist pattern. CONSTITUTION: A film type transfer material comprises a supporter film, and a photopolymerizable photoresist layer including a binder polymer, a photopolymerizable monomer, a photoinitiator and a novolac resin with an acid value of 20-250 gKOH/g. The photopolymerizable photoresist layer comprises a novolac resin and a photoacid generator instead of a novolac resin with an acid value of 20-250 gKOH/g. The photoacid generator is at least one selected from 2,3,4,4'-tetrahydroxybenzophenone-1,2-naphtoquinone azide-5-sulfonate, 2,3,4-trihydroxybenzophenone-1,2-naphtoquinone azide-5-sulfonate, and (1-[1-(4-hydroxyphenyl)isopropyl]-4-[1,1-bis(4-hydroxyphenyl)ethyl]benzene)-1,2-naphtoquinone diazide-5-sulfonate. |
