摘要 |
PURPOSE: An inertia sensor is provided to utilize photo-resist utilized for forming a mass by etching as an impact-absorbing layer, thereby improving the shock resistance of the inertia sensor without additional processes. CONSTITUTION: An inertia sensor(100) comprises a membrane(110), a mass(120), a post(130), and a first impact-absorbing layer(140). The mass is arranged under the central portion(113) of the membrane. The post is arranged under edge portions(115) of the membrane. The first impact-absorbing layer is formed of photo-resist in the underside of the mass. |