PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, AND SEMICONDUCTOR DEVICE USING THE PHOTOSENSITIVE RESIN COMPOSITION OR THE PHOTOSENSITIVE RESIN COMPOSITION FILM

摘要

Disclosed are a photosensitive resin composition and a photosensitive resin composition film, each of which has small stress after curing and exhibits excellent adhesion after thermal compression bonding. Specifically disclosed is a photosensitive resin composition which is characterized by containing: (a) an alkali-soluble polyimide which has a structural unit represented by general formula (1), while having a structure represented by general formula (2) and/or (3) at at least one end of the main chain; (b) a compound which has two or more epoxy groups and/or oxetanyl groups in each molecule; and (c) a quinonediazide compound. The photosensitive resin composition is also characterized in that: less than 10 parts by weight of an acrylic resin is contained per 100 parts by weight of the polyimide (a); and the content of the compound (b) is not less than 20 parts by weight per 100 parts by weight of the polyimide (a).