| 摘要 |
An exposure apparatus includes a stage (10) for holding a substrate (8) to be exposed; a direct writing mask (6) arranged above the substrate (8) to be exposed held by the stage (10); a repeated opening pattern in which a plurality of openings (6c) each having approximately the same size are arranged in a line at approximately the same interval, provided to the mask; an irradiation mechanism for irradiating with a linear laser beam (1c) along the repeated opening pattern; and a movement mechanism for moving a relative position of a laser beam which is formed in such a way that the linear laser beam formed by the laser processing mechanism passes through the plurality of openings of the opening pattern and the substrate held by the stage. |
