| 摘要 |
The present invention relates to a photoresist composition which is suitable to make circuit of the LCD device, semiconductor integrated circuit and the like microcircuits, concretely it relates to a photoresist composition which includes the novolac resin represented by the following chemical formula 1, the diazo photosensitive chemical compound and the organic solvent. In the chemical formula 1, R represents hydrogen, hydroxyl group or methyl group, and n is the intact number from 3 to 20. The photoresist composition of the invention, as the novolac resin is added, is provided with excellent fire-resisting property and resolving capability, and can improve the homogeneity of the pattern. The novolac resin is polymerized by the aromatic alcohol, and the aromatic alcohol contains meta-cresol, para-cresol and resorcin. |
