| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas supply device which is disposed in counter to a substrate within a processing vessel and capable of fast replacing a gas in an internal flow passage when performing gas processing by supplying the gas to the substrate.SOLUTION: A gas supply device comprises a main body part, a gas introduction port and a partition member. The main body part forms a gas circulation space which is substantially conical, for circulating a gas from a reduced diameter end side to an expanded diameter end side. The gas introduction port is provided at the reduced diameter end side in the gas circulation space for introducing the gas into the gas circulation space. The partition member is provided for concentrically partitioning the gas circulation space in such a manner that a degree of spreading becomes larger toward the outside. Therefore, in comparison with a conventional gas shower head, conductance in a gas flow passage within the gas supply device is enlarged and gas replaceability in the gas flow passage can be improved. |
