METHOD FOR MANUFACTURING DEVICE WITH SUBSTRATE HAVING UNEVEN PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a device with a substrate having an uneven pattern and used for light diffraction and scattering with high throughput.SOLUTION: A method for manufacturing a device includes: a step P1 of forming a substrate by coating a sol-gel material on the substrate and transferring a prescribed uneven pattern to the coated sol-gel material; a step P2 of cleaning the substrate in which the uneven pattern is formed; a step P3 of forming a first electrode on the cleaned substrate by patterning; a step P4 of annealing the substrate in which the first electrode is formed; a step P5 of forming a thin film on the annealed substrate; and a step P6 of forming a second electrode on the thin film. A device manufacturing process has resistance because it uses the sol-gel material.